ニコン:半導体の三次元化に対応:ArF液浸露光装置(動画):
Nikon: Supports 3D semiconductors: ArF immersion exposure equipment:
尼康:支持三维半导体:ArF浸入式曝光设备
ー「inline Alignment Station(iAS)」を搭載ー
ニコン:
10月18日、
- 先端半導体デバイス製造に対応する、
- ArF液浸スキャナ「NSR-S636E」を、
- 2023年発売することを発表した。
ArF液浸スキャナ「NSR-S636E」:
露光装置は、「inline Alignment Station(iAS)」を搭載。
- 多点アライメント計測と高次補正により、
- 半導体デバイス構造の三次元化に必要な、
- 高重合精度と高生産性の両立を目指し、
3D用ArF液浸露光装置を開発した。
利用対象分野:
- ロジック半導体やメモリ半導体、
- CMOSイメージセンサなど、
最先端の半導体デバイス製造に対応する。
TECH+
https://news.mynavi.jp/article/20211018-2162809/
Nikon Announces Development of the NSR-S636E ArF Immersion Scanner
TOKYO –
Nikon Corporation (Nikon)announced it is currently developing the next-generation NSR-S636E ArF immersion scanner, which will deliver superior overlay accuracy and ultra-high throughput to support manufacturing of the most critical semiconductor devices.
Product sales are scheduled to begin in 2023.
As the digital transformation (DX) accelerates, there is an essential need to process and communicate tremendous volumes of data very quickly.
High-performance semiconductors
are imperative to satisfy these requirements, and semiconductor device technology is progressing with a simultaneous focus on circuit pattern miniaturization as well as 3-dimensional (3D) device structure development
The NSR-S636E features an enhanced inline Alignment Station, or iAS,
which is a wafer pre-measurement module integrated between the coater/developer unit and the lithography scanner.
The S636E and iAS
utilize sophisticated multi-point alignment measurement and high order correction functionsthat enable device makers
to achieve the stringent overlay accuracy necessary for 3D device structures, while also maximizing immersion scanner productivity.The NSR-S636E
is well-suited for cutting-edge semiconductor manufacturing including logic and memory devices, CMOS image sensor applications and more.Nikon | News |
https://www.nikon.com/news/2021/1018_nsr-s636e_01.htm
Alignment Stations – Nikon Precision
https://www.nikonprecision.com/products-and-technology/alignment-stations/