The new building at Osaka Works is due to be completed in the first half of FY2022.
( Source: Deposit Photos )
住友化学：フォトレジストの生産拡大：大阪工場を建設、評価設備を新設（動画）：
Sumitomo Chemical to Expand Photoresists：
住友化学扩大光致抗蚀剂
ビジネス27.04.2020
住友化学：
- EUVリソグラフィー、
- 高度な半導体プロセス用のフォトレジスト、
上記の開発と品質保証システム強化を図ります。
市場でのフォトレジストの需要の増加に対処します。
日本：住友化学
大阪工場に新棟を建設し、評価設備を新設、開発体制の強化を図ります。
このプロジェクトを、2022年度上期に完了する予定。
大阪工場でEUVなど最先端プロセス向け半導体フォトレジストの開発・評価体制を強化
2020年04月22日
住友化学
EUV（極端紫外線）最先端プロセス向け半導体フォトレジストの開発・評価体制強化のため、
大阪工場に新棟を建設するとともに、新規評価装置を導入することといたしました。
2022年度上期の完成を目指します。
フォトレジスト
半導体製造工程におけるパターン形成に使用される感光性樹脂です。
高機能フォトレジスト
- 原料設計や量産化技術に加え、
- 製造・研究・販売の大阪工場構内集約
- タイムリーな顧客対応力などを生かし、
フォトレジスト事業を拡大してきました。
旺盛な需要に応えるため、2019年度には、当社が世界的に高いシェアを有する液浸ArF（フッ化アルゴン）露光向けフォトレジストについて、大阪工場で新プラント建設による生産能力増強を行いました。
半導体市場においては今後、
- AI技術の進化や
- 5Gの本格商用化
などを背景に先端半導体の需要伸長が期待されています。
こうした領域：
新しい光源であるEUV露光が主流になると見込まれ、そのパターン形成にはさらなる微細化に適したフォトレジストが求められています。
今回の体制強化：
- クリーンルームの新棟を建設し、
- 新たな露光機を導入することによって、
- EUVレジストなどの開発効率を向上させ、
顧客へのレスポンスを加速します。
事業・製品 | 住友化学株式会社
https://www.sumitomo-chem.co.jp/news/detail/20200422.html
Sumitomo Chemical to Strengthen Development and Quality Assurance System of Photoresists for EUV and Advanced Semiconductor Processes in Osaka Works
Apr. 22, 2020
Sumitomo Chemical
has decided to construct a new building in its Osaka Works (Konohana-ku, Osaka, Japan)
and install new evaluation equipment, with the goal of strengthening the development and quality assurance system for photoresists for EUV (extreme ultraviolet) lithography and other advanced semiconductor processes.
This project is due to be completed in the first half of FY2022.
Photoresists
are light-sensitive resin materials used in semiconductor photolithography processes.
Sumitomo Chemical has expanded its photoresist business by designing high-performance raw materials for photoresists and using its mass production technology,
while responding to customers timely through the integration of manufacturing, R&D, and sales functions in the Osaka Works.
To meet the bullish demand for photoresists,
Sumitomo Chemical
expanded production capacity for photoresists, of which it has a large market share in the world, for ArF (argon fluoride) immersion exposure in FY2019 by constructing a new plant in the Osaka Works.
In coming years, higher demand for the latest semiconductors is expected, against the backdrop of evolving
- artificial intelligence (AI) technology and
- the full-fledged commercialization of the next-generation communication system (5G).
In the cutting-edge semiconductor area,
- EUV exposure, a new light source,
- is expected to become a mainstream.
- For its pattern formation,
photoresists suitable for further die shrink will be more in demand.
The company dramatically improved the performance of EUV photoresists by designing materials based on its unique concept and abundant knowledge it has cultivated to date.
The higher performance has been loudly cheered by customers and the company plans to mass-produce those high-performing EUV photoresists.
This structural enhancement is part of the company’s mid- to long-term plan to strengthen the operating base of the photoresist business for future growth.
By constructing a new building equipped with clean rooms and introducing new exposure equipment,
the company will increase its development efficiency of EUV photoresists and accelerate its response to customers while further enhancing the quality assurance system.
The company will also consider further investment in line with the future expansion of business in the cutting-edge photoresists area including EUV.
Sumitomo Chemical positions Information and Communication Technology (ICT) as one of the key areas in its Corporate Business Plan.
The company
will expand its portfolio in the entire semiconductor materials business by promoting growth of not only photoresists but also high-purity chemicals and compound semiconductor materials,
Business & Products | SUMITOMO CHEMICAL
https://www.sumitomo-chem.co.jp/english/news/detail/20200422e.html