JSR・Inpria：新DRAM・EUVレジスト実証！
Demo van de nieuwste fotoresist voor DRAM!
최신 DRAM용 포토레지스트를 실증!
Demo the latest EUVresist for DRAM！
展示用於 DRAM 的最新光刻膠
ーSKハイニックスと米国で試験ー
ー非常に低い欠陥レベルを達成ー
JSR・Inpria
SKハイニックス8月2日、
次世代DRAMに向け、 EUV用金属酸化物レジストの共同試験が進んでいる。
JSR・Inpria：
「JSRの傘下に入ったInpria社」が取り組んでいるもの。
「最先端DRAMチップ製造への応用検討」が加速している。
Inpriaの技術：
EUV用金属酸化物レジストで、広範な特許を持つ。
最先端のDRAMチップ製造に必要な微細加工性能だけではない。
「製造工程に必須とされる非常に低い欠陥レベルを達成すること」が評価されている。
（電波新聞デジタル） – Yahoo!ニュース
https://news.yahoo.co.jp/articles/cf994cacced2bd0bfe775f094f6532b63bf7b0a3
JSR/Inpria: Demonstratie van de nieuwste fotoresist voor DRAM!
– Praktijktest in de VS met SK Hynix –
ーZeer lage defectniveaus bereikenー
JSR・Inpria
SK Hynix
2 augustus
Gezamenlijke tests van metaaloxide-resists voor EUV zijn aan de gang voor de volgende generatie DRAM.
JSR・Inpria:
Er wordt aan gewerkt door “Inpria, dat een dochteronderneming is geworden van JSR.”
“Onderzoek van toepassing op geavanceerde DRAM-chipproductie” versnelt.
Inpria-technologie:
EUV metaaloxide resist met uitgebreide patenten.
Het gaat niet alleen om de microfabricageprestaties die nodig zijn om geavanceerde DRAM-chips te maken.
Het wordt gecrediteerd met “het bereiken van zeer lage defectniveaus die essentieel zijn in het productieproces”.
(Denpa Shimbun Digital) – Yahoo! Nieuws
JSR・Inpria：최신 DRAM용 포토레지스트를 실증!
– SK하이닉스와 미국에서 실용 시험
– 매우 낮은 결함 레벨 달성 –
JSR·Inpria
SK하이닉스
8월 2일,
차세대 DRAM을 향해 EUV용 금속 산화물 레지스트의 공동 시험이 진행되고 있다.
JSR·Inpria:
「JSR의 산하에 들어간 Impria사」가 임하고 있는 것.
「최첨단 DRAM 칩 제조에의 응용 검토」가 가속하고 있다.
Inpria 기술:
EUV용 금속 산화물 레지스트로 광범위한 특허를 가진다.
최첨단 DRAM 칩 제조에 필요한 미세 가공 성능만이 아니다.
“제조 공정에 필수적인 매우 낮은 결함 레벨을 달성하는 것”이 평가되었다.
(전파신문 디지털) – Yahoo!뉴스
Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM
TOKYO – August 2, 2022 –
JSR Corporation announced today acceleration of its co-development with SK hynix Inc.
to apply Inpria, a JSR company’s Extreme Ultraviolet (EUV) metal oxide resist (MOR) for manufacturing advanced DRAM chips.
Inpria’s broadly-patented metal oxide photoresist platform for EUV
enables customers to efficiently pattern advanced node device architectures.
Inpria material solutions
provide the performance needed to significantly reduce the cost of EUV patterning and are compatible with proven processes and equipment configurations.
Inpria’s MOR can be applied by a standard spin coating process.
“EUV manufacturing is complex and requires cutting-edge materials,” said BK Lee, head of R&D process at SK hynix.
“Tin-oxide resists show promise to deliver both on performance and also on lower manufacturing cost for the next generation of state-of-the-art DRAM.”
Inpria is the leader in metal oxide EUV resists and has achieved the world’s highest resolution using EUV exposure systems.
JSR acquired Inpria 2021 and, as EUV adoption continues to increase,
is investing in expanding production capabilities and customer support services for high volume manufacturing.
2022 | News | JSR Corporation
https://www.jsr.co.jp/jsr_e/news/2022/20220802.html
JSR Closes Deal to Acquire EUV Pioneer Inpria Corporation
– Semiconductor Digest
JSR announced that it completed the acquisition of Corvallis, OR-based Inpria Corporation on Oct. 29, making it a wholly owned subsidiary of JSR.
Inpria, now a JSR company, is a world leader in metal oxide photoresist design, development and manufacturing for extreme ultraviolet (EUV) lithography.
Inpria will immediately begin integrating into the JSR family but will retain the name Inpria at this time and remain headquartered in Oregon, effectively expanding JSR’s Oregon footprint to three locations.
JSR’s General Manager of Advanced Lithography Material Business Promotion Department and Corporate Officer, Toru Kimura,
will lead the integration and EUV expansion efforts.
https://www.semiconductor-digest.com/jsr-closes-deal-to-acquire-euv-pioneer-inpria-corporation/