AGC to Make Drastic Expansion to Supply System for EUVL Mask Blanks
AGC
began conducting R&D on photomask blanks to be used as a consumable part for semiconductor production using EUV lithography technology in 2003.
By combining its core technologies (i.e. glass materials, glass processing, and coatings),
it continued technological development of photomask blanks and began production of EUVL mask blanks in 2017.
AGC
has made necessary investments to meet market demand, and to respond to further expansion of the EUV lithography market,
As the world’s only manufacturer of the photomask blanks
has decided on this drastic expansion of the supply system for EUVL mask blanks.
As the world’s only manufacturer of the photomask blanks that can handle every aspect from glass materials to coating,
a global market share of 50% in 2025
AGC will establish a mass production system to meet growing market demand, with the aim of achieving target sales of 40 billion JPY or more and a global market share of 50% in 2025.
News ｜ AGC