The Univ of Tokyo: Atomic level flatness achieved with water and acrylic plate
Amazing atomic level polishing technology
The Univ of Tokyo:
While pouring water
Polish the silicon substrate with an acrylic plate and
Atomic level flatness has been achieved.
A surface roughness of 0.037 nm was achieved without using chemicals or abrasive grains.
Polishing of silicon substrate:
The running cost is only water and electricity for the equipment.
We will propose polishing and cleaning finish processing.
Polishing the board with an acrylic board:
Rotate the acrylic plate and press the object to be polished while pouring water on it.
Acrylic resin is hydrolyzed and carboxylic acids are lined up on the surface.
This is causing chemical polishing.
Actual polishing performance:
It was actually polished with glass.
Root mean square roughness (RMS):
Glass:
It was possible to polish from 0.276 nm to 0.073 nm.
silicon:
The 0.334 nm substrate could be polished to 0.037 nm.
Benefits of new technology:
The new technology leaves no chemicals or fine particles.
The acrylic board can be used semi-permanently.
Field of use
We propose it for finishing processes such as relaxation of residual stress on the crystal surface and cleaning.
It will be applied to silicon carbide (SiC) in the future.
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