Semiconductors in China: Procurement risk of cutting-edge EUV exposure equipment: SMIC delayed by 3 generations
DNP Develops Photomask Process Targeting 5nm EUV Lithography
Mitsubishi Electric: SiC-MOSFET/Circuit Simulation: New SPICE model developed
NEDO: Edge AI chip: Power efficiency 10 times, SLAM processing time 1/20
Japan: semiconductor manufacturer, local production in Korea: Tosoh, ADEKA, Tokyo Electron