Sumitomo Chemical: Korea’s first photoresist factory: Newly established at Dongwoo Fine-Chem

Sumitomo Chemical: Korea’s first photoresist factory: Newly established at Dongwoo Fine-Chem

Sumitomo Chemical:

Established the first overseas factory in South Korea as a state-of-the-art photoresist for semiconductors.

South Korea’s Dongwoo Fine-Chem:

Dongwoo Fine-Chem, a wholly owned subsidiary of Sumitomo Chemical.

A manufacturing plant for immersion argon (ArF) resist will be constructed at the Masuyama Plant.

In South Korea, the final process of mixing raw materials and producing resists is carried out.

It will be put into operation in the first half of 2024.

Secure cutting-edge resist production capacity:

The production capacity of the Osaka plant in Japan will also be increased.

In 2024, the production capacity of cutting-edge resists will be increased by about 2.5 times compared to FY19.

Photoresist:

Process material used for semiconductor circuit pattern formation.

Currently Sumitomo Chemical

ArF and immersion ArF, and
State-of-the-art resist for EUV,
Centralized production at the Osaka factory.

It decided to produce in South Korea for “rapid demand expansion and business continuity plan (BCP) strengthening”.

New switch

https://newswitch.jp/p/28628

Sumitomo Chemical to Expand Facilities in South Korea

The ArFi photoresist

is the photoresist that is most widely used for memory and foundry processes.

The investment is expected to contribute to not only Dongwoo Fine-Chem’s production technologies

but also the supply chains of Samsung Electronics and SK Hynix and the advanced semiconductor industry of South Korea as a whole.

With Sumitomo Chemical planning to produce the semiconductor material in South Korea,

much attention is being paid to

whether other Japanese photoresist suppliers, such as JSR and Shin-Etsu, will follow suit.

It is also said that

Dongwoo Fine-Chem is planning to produce EUV materials such as EUV photoresist as well.

Businesskorea

http://www.businesskorea.co.kr/news/articleView.html?idxno=75547