USHIO: Mass production of semiconductors using EUV: “Extreme ultraviolet lithography” light source technology
USHIO:
Supply network is being prepared for mass production of semiconductors using EUV
Light source for mask inspection equipment, expected to sell 3 billion yen in FY2019
In the light source business of inspection equipment, which is indispensable for next-generation semiconductor manufacturing, we aim to make a profit in FY2020.
Mass production of light sources for mask inspection equipment.
Our light source: small size and high brightness
Our light source is excellent in that it is small and has high brightness.
In July this year, the first light source was delivered to an inspection equipment manufacturer for mass production.
Miniaturization of circuit line width is the key to improving semiconductor performance.
Sales prospect: Light source for mask inspection equipment
Light sources for mask inspection equipment account for 20% of USHIO’s sales.
It is positioned in the optical equipment business and is expected to sell 3 billion yen in FY2019.
Next-generation semiconductors using EUV technology:
The following companies are working on mass production of next-generation semiconductors using EUV technology.
Samsung Electronics in Korea
Taiwan Product Line Manufacturing (TSMC)
US Intel
Japanese manufacturer:
Japanese manufacturers lost their share in semiconductor production.
However, we maintain a high global market share for “important materials and related equipment development” that is essential for semiconductor manufacturing.
In the EUV field, JSR and Tokyo Ohka Kogyo are producing resists for circuit baking.
Only HOYA and AGC produce mask blanks that are the basis of masks.
Lasertec dominates the market for its inspection equipment.
Bloomberg
https://www.bloomberg.co.jp/news/articles/2019-09-02/PWITE3T0AFB701?srnd=cojp-v2