💡AIST: Develop technology for easily detecting crystal defects from transmission electron microscope images
We promoted the improvement of device process technology of next generation semiconductors with distribution display of defects. Development of image processing technology to detect atomic level defects from transmission electron microscope image of crystal structure
- Successful visualization of defect distribution of next generation semiconductor device
- Contributing to the establishment of device process with low defect occurrence rate
- Details of this technology was published as Accepted Manuscript on the online edition of UK scientific journal Nanotechnology on September 19.
http://www.aist.go.jp/aist_j/press_release/pr2017/pr20170921/pr20170921.html