IMS多光束遮罩绘图设备（来源：IMS网站）
Lasertech掩模检查设备（来源：Lasertech网站）
台积电和三星：EUV的外围技术采购：制图设备，检查设备
12月14日
韩国etnews：
EUV光刻外围技术：
口罩电子束口罩拉丝装置
也用于口罩的外观检查装置
据悉，台积电与三星正在为之奋斗。
半导体制造必不可少的：
这些设备的生产能力低于EUV曝光设备，并且难以采购。
即使能够获得EUV曝光装置，如果不能固定这些外围装置，也会阻碍使用EUV制造半导体装置。
EB掩模绘图设备：IMS纳米加工
EUV的多光束EB掩模绘图设备由奥地利的IMS Nanofabrication处理。
EUV的外观检查设备：Laser Tech
另一方面，EUV的视觉检查设备由日本激光技术公司处理。
我的Navi新闻
https://news.mynavi.jp/article/20201217-1597761/
Samsung Electronics and TSMC Looking to Secure Advanced Semiconductor Manufacturing Systems Faster than the Other –
Competition between Samsung Electronics and TSMC to secure equipment necessary for ultra-microfabrication process in addition to EUV (Extreme Ultraviolet) lithography system,
which is only provided by ASML, faster than the other is becoming more intense.
APMI (Actinic Pattern Mask Inspection) system and writer for manufacturing masks are prime examples.
These instruments
are key instruments that will determine productivity and quality when there are increased supplies of chips that are smaller than 5 nanometers.
Both instruments
are also only supplied by a single manufacturer just like EUV lithography system.
According to the industry on Monday, global semiconductor manufacturers such as Samsung Electronics and TSMC
are engaged in a fierce competition in order to secure advanced equipment necessary for ultra-microfabrication process faster than the others.
As EUV lithography process
has recently emerged as the solution for manufacturing next-generation microchips within the global semiconductor industry,
competition to secure ASML’s EUV lithography system
has become a huge topic. ASML is the only company in the world to supply EUV lithography systems that cost more than $137 million (150 billion KRW) per unit.
Electronic beam-based writer
However, there are also other advanced systems
in addition to EUV lithography system that global semiconductor manufacturers are having difficulty to purchase due to lack of suppliers.
Electronic beam-based writer that prints circuit layout onto EUV masks and inspection system that inspects EUV masks whether they can be used are prime examples.
E-beam writer
plays a “brush” role that prints integrated circuit layout onto masks that are absolutely necessary in order to print integrated circuit layouts onto wafers during lithography process.
ArF-based lithography process
E-beam writer manufactured by NuFlare that is based in Japan is currently used for ArF-based lithography process.
However, it is difficult for NuFlare’s E-beam writer to exhibit its full potential under an EUV environment.
Austria-IMS and Japan-Lasertec
The problem is
that both multi-beam writer and APMI system are also made by single company just like EUV lithography system.
Austria-based IMS and Japan-based Lasertec
are the only companies in the world that supply multi-beam writers and EUV mask inspection systems respectively.
ETNews